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SU8 Photolithography System
(UV-KUB 2)
 


Overview

The UV-KUB is an exposure and masking​ system equipped with the LED technology with a long lifetime (>10000h). Additionally, It has a resolution of 2 micrometer, with a wavelength, ranges from 365 nm to 405 nm, as well as an illumination capacity on a surface of up to ​4 inches. Also, the system equipped with a cold UV exposure and in-situ temperature control, as a result, the substrate environment surrounded by a homogeneous exposure all over the surface, so that prevents any defective thermal consequences. 

Applications:
1. Laboratories and R&D optics.
2. Biotechnology.
3. Micro technology (microfluidic).
4. Photolithography (masking, wafer bonding, simple layer or adhesive curing, connections).
5. Assemblies and Biological or cells culture.